sputtering deposition的例句大全

Research on thin film deposition rate deposited by sputtering

溅射镀成膜速率的研究

Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering

射频磁控溅射沉积薄膜的计算机模拟

The planar magnetron sputtering target for α-si: h thin film deposition

淀积α-Si：H薄膜的磁控靶

Thin film deposition by ICP-enhanced nonequilibrium magnetron sputtering process For ICP AES analysis.

射频等离子体增强非平衡磁控溅射沉积技术分析过程冗长，不利于生产质控。

Since magnetron sputtering is an extremely effective thin film deposition method of high-speed, low-temperature and low-damage, we deposit aluminum oxide films by RF reactive magnetron sputtering, and study their preparation and properties in theory and experiments.

鉴于磁控溅射作为一种高速、低温、低损伤的十分有效的薄膜沉积方法，我们选择射频反应磁控溅射法制备A1203薄膜，从理论和实验上研究了Al203薄膜的制备和性能。

RF magnetron sputtering has been applied to SiO 2 deposition for a long time, but for economic mass production of film coating on large size its use is limited due to the higher cost and lower efficiency.

磁控溅射法制备SiO2膜传统上采用射频溅射工艺，但它成本较高，效率较低，无法充分满足大面积镀膜工业生产的需要。

HfO_2 films were prepared by electron beam ( EB) evaporation, ion assisted deposition ( IAD) and dual ion beam sputtering ( DIBS);

HfO2薄膜利用电子束蒸发（EB）、离子束辅助（IAD）和双束离子束溅射（DIBS）三种方法沉积。

Compared with reactive sputtering and reactive evaporation deposition, indium oxide fims thus prepared has better adhesion to the glass substrates with improved surface hardness due to the high implantation energy.

与反应溅射和反应沉积相比，此法制备的氧化相膜与玻璃基体的附着良好，并因高的注入能量而改善了玻璃表面硬度。