magnetron

The kinetic process of reactive magnetron sputtering has been studied.

研究了反应磁控溅射的动力学过程.

Tin doped indium oxide ( ITO) films were deposited on glass substrates by reactive magnetron sputtering using a metallic alloy target ( In Sn, 90 10).

采用铟锡合金靶（铟锡，90-10），通过直流反应磁控溅射在玻璃基片上制备出ITO薄膜，并在大气环境下高温退火处理。

Study of ITO Transparent Conducting Thin Films Deposited by DC Magnetron Reactive Sputtering

直流磁控反应溅射沉积ITO透明导电膜的研究

Si rich SiO 2 films have been prepared by a rf magnetron sputter method.

用射频磁控溅射法制备了富硅二氧化硅薄膜.

Microstructure and Mechanical Properties of Diffusion Bonded Joints Between Carbon Steel and Titanium with Copper Interlayer Ti-Al Film Used as Diffusion Barrier for Copper Interconnection Deposited by RF Magnetron Sputtering

钢/铜/钛扩散复合界面显微组织和力学性能磁控溅射法制备用作铜互连阻挡层的钛-铝薄膜

Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering.

摘要采用射频磁控溅射技术在改性氟塑料表面沉积铝层,制备了金属/氟化高聚物复合薄膜.

Magnetron is often used as microwave power source in clinical linac magnetron.

在医用直线加速器中通常都采用磁控管作为微波功率源.

Through analysis we review methods fabricating thin film cathode, including chemical acetate base solution technique, sol-gel method, laser ablation, plasma enhanced chemical vapor deposition, pulsed laser deposition, radio frequency magnetron sputtering deposition, and electrostatic spray deposition.

评论了近年来制备薄膜阴极的方法，包括化学酸基溶解法、溶胶-凝胶法、激光焙烧法、增强型等离子体化学气相淀积法、脉冲激光法、电子束喷射沉积法和射频磁控溅射法。

Methods: The nature HA films were prepared by electron beam evaporation and rf-magnetron sputtering techniques.

方法: 用电子束蒸发和射频磁控溅射两种技术制备了天然HA薄膜.

Study on the Rotary Magnetron Sputtering Coater of Double Chambers

双室旋转磁控溅射镀膜机的研制

Research for Technique of Large-area Indium-Tin Oxide Film by Magnetron Reactive Sputtering Method

磁控反应溅射制备大面积掺锡氧化铟薄膜工艺探讨

Ti-O film was prepared by microwave-electron convolute resonance ( MW-ECR ) magnetron filter arc deposition process.

采用微波电子回旋 共振 磁过滤弧设备制备钛氧薄膜.

Thin film deposition by ICP-enhanced nonequilibrium magnetron sputtering process For ICP AES analysis.

射频等离子体增强非平衡磁控溅射沉积技术分析过程冗长，不利于生产质控。

Plasma Emission Monitoring and TiO_2 Films Growth by Mid-Frequency Dual Magnetron Reactive Sputtering

等离子体发射监控系统参与的中频孪生反应磁控溅射沉积TiO2薄膜的实验研究

Boron carbon nitride ( BCN ) thin films were deposited by radio frequency ( RF ) magnetron sputtering .

采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜.

For stable operation of the magnetron, the preoscillation voltage should be lower than ehe threshold voltage, while the mode of this space charge oscillation should be the same as the π mode oscillation on the resonating cavities.

为了使磁控管能稳定工作，就要使预振电压低于门槛电压，并且使空间电荷振荡的模式与谐振腔上高频振荡的π模同步。

Experiment and Design for Reducing the front Time Jitter of Coaxial Magnetron

降低同轴磁控管前沿抖动的实验与工程设计

Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.

采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.

Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.

利用低频反应磁控溅射制备五氧化二铌光学薄膜.

The generator represents magnetron , packaged with constants and electromagnets ( 2 coils magnetic ) in the magnetic-shielded ceramic-metal execution.

该磁控管的设计采用电磁石,封装采用金属陶瓷.

The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.

利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜.

In the fourth chapter Sb-doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.

第五章研究了直流磁控溅射制备Sb掺杂 TiO2的成膜特点.

The Electrochromic Properties of Nickel Oxide Films Prepared by Magnetron reactive Sputtering

磁控反应溅射氧化镍薄膜电致变色特性的研究

Suitable for making heating element for electrical oven and magnetron.

适用于制作电气炉发热元件等.

The main contents include: Firstly, ZnO films with different OPP were deposited on quartz substrates by RF magnetron sputtering.

具体内容有：（1）利用射频磁控溅射在石英基片上沉积ZnO薄膜，研究氧分压对ZnO薄膜的结构和光电学性质的影响。

Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.

采用磁控射频反应溅射法在单晶硅片上制备了二氧化硅薄膜.

Its principle and some other aredescribed, including the magnetron sputter coater and the osmium plasma coater.

本文将主要叙述等离子溅射镀膜的原理与方法,并且简单介绍磁控管溅射仪和锇等离子镀膜仪等.

RF magnetron sputtering has been applied to SiO 2 deposition for a long time, but for economic mass production of film coating on large size its use is limited due to the higher cost and lower efficiency.

磁控溅射法制备SiO2膜传统上采用射频溅射工艺，但它成本较高，效率较低，无法充分满足大面积镀膜工业生产的需要。

Influence of Ar and Nz Flow Ratio on TiN Thin Films Prepared by Magnetron Sputtering

氩气与氮气流量比对磁控溅射法制备TiN薄膜的影响

The generator represents magnetron, packaged with constant magnets in ceramic-metal execution.

该磁控管采用金属陶瓷封装,装有永磁体.