photolithography

In integrated circuits, the defects associated with photolithography will generally be assumed to take the shape of circular discs in order to perform the efficient estimation of yield and fault analysis.

在集成电路（IC）中，为了进行有效的成品率估计和故障分析，与光刻有关的缺陷形状通常假设为圆模型。

The third part is to use the sputtering, photolithography to produce heaters and temperature sensors which heat the reaction micro chamber and provide the temperature condition for the PCR reaction.

第三，用溅射、光刻等工艺在微型腔体底部制作微型加热器和温度传感器，实现对反应腔体的加热及其温度的精确测量，提供PCR扩增反应所需的温度条件。

Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference

用多光束干涉实现纳米级阵列图形的长焦深光刻

The patterned anodic aluminum oxide ( AAO ) template was fabricated by UV photolithography.

采用紫外光刻法制得图案化的阳极 氧化铝 模板.

design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography

原子光刻用超高真空蒸发设备的设计和建立

With 300 lines of Photolithography and screen resolution, with cyberctm indosinian.

如果采用300线网屏的特技照相制版,就可获得有动感的印成品了.

In Fig . 3 B, avidin protein was printed by photolithography onto a biotinylated PSI surface.

三号乙, 抗生物素蛋白印刷光刻到生物防扩散表面.

Justifying machine for use in photolithography or offset printing

齐行机，照相平板版印刷或胶版印刷用

that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.

测试晶圆片-影印过程中用于颗粒计算、量溶解度和检测金属污染的晶圆片。

Spherical aberration can damage image quality in photolithography.

球面像差能破坏光刻的成像质量。

And uniforming optical resist system as a step of the Photolithography process, has a direct impact on the subsequent sequences and final graphic quality.

而匀胶系统作为光刻工艺的第一大步，直接影响着后续工步和最终图形的质量。

Atom photolithography is a new application of atom optics in microfabrication technical field.

原子光刻是原子光学在微细加工技术领域的新应用.

Alignment Precision-Displacement of patterns that occurs during the photolithography process.

套准精度 - 在光刻工艺中转移图形的精度.

Litho process usually refers to get photolithography masking graphics accurately copy to the photo resist layer above the material.

光刻工艺通常指采用照相的方法将光刻掩模的图形精确地复印到表面的光刻胶硅片上面。

The washer type bicrystal junction dc SQUID magnetometer was patterned using standard photolithography and ion-etching methods.

通过标准光刻和离子束刻蚀工艺制备出了高温超导垫圈型双晶结dc SQUID磁强计。

And then, photolithography and wet etching were used to pattern the ITO films for electrical measurement, which involved the measurement of temperature coefficient of resistance and the gauge factor.

然后用光刻和刻蚀的方法制作电学测试所需的图形。对于ITO薄膜的电学测试包括对其电阻温度系数和响应因子的测量两部分。

BARC Process Used for Sub-micrometer Photolithography

BARC工艺在亚微米光刻中的应用

relationship of mask feature size with ope in photolithography

光学邻近效应与掩模特征尺寸的关系