photoresist

Analysis of Effect on Uniformity of Photoresist Layer in Spin Coating

离心式涂胶膜厚均匀性的影响因素分析

This paper reports a simple process using photoresist as sacrificial layers to fabricate movable microstructures.

报道了用光致抗蚀剂作牺牲层材料制作可动微机械结构的一种新技术.

Through optical film, adhesive, photoresist and Polaroid making and applies for LCD screen making, UV-applications in LCD making is introduced.

通过光学功能薄膜、粘合剂、光刻胶和偏光片等的制作和在LCD显示面板制造中的用途，介绍了辐射固化技术在液晶显示器制作中的应用。

Photoresist edge build up

硅片边缘上光刻胶的积累

Optical SSB modulation using fiber Bragg grating and its transmission performance photoresist edge build up

基于窄带光纤光栅的单边带调制及其传输特性硅片边缘上光刻胶的积累

The mechanisms of dissolution inhibition of positive photoresist based on novolak ( NVK)-diazonaphthoquinone ( DNQ), including ( 1) the molecular hydrogen bonding interactions between novolak and DNQ;

本文综述了酚醛重氮萘醌正性抗蚀剂的溶解抑制机理，主要包括（1）分子间氢键作用机理；

These data include photoresist strip rate, low-k film thickness loss and refractive index change, strip selectivity, k-value shift, FTIR spectra, as well as TDS and SIMS analysis results.

这些数据包括抗蚀剂去胶速率、低k膜厚度损失及折射指数变化、除胶选择性、k值变化、FTIR光谱以及FDS和SIMS分析结果。

The photoresist sample prepared was evaluated by SEMATECH. Its best resolution is 0.1 μ m, the minimun exposure dose is 26 mJ/ cm2; it has not only excellent resolution and photosensitivity, but also good adhesiveness and anti-dry etching.

研制出的样品经美国SEMATECH实验室应用评价其最佳分辨率为0.1μm，最小曝光量为26mJ/cm2，不但具有优异的分辨率和光敏性，而且还具有良好的粘附性和抗干法腐蚀性。

Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.

通过反应离子刻蚀可以将光刻胶微透镜图形转移至这种高性能的聚合物材料上。

Dissolution inhibition mechanisms of positive photoresist based on novolak-dnq

酚醛-重氮萘醌正性抗蚀剂溶解抑制机理

We have developed a method to measure the glass transition temperature of photoresist in situ.

我们研究出了一种方法来测量光刻胶玻璃的过渡温度.

Therefore, organic pigment must to be fine and symmetrical in the photoresist.

因此, 有机颜料必须以微细、均匀的状态存在于光阻剂中.

Study on the properties of photoresist baking process

光刻胶烘培特性研究

This photoresist have thermal stabilityand high resolution.

该光刻胶具有热稳定性和高分辨率性.

This paper introduces a technical method of etching optical dividing disc with 302~# negative type photoresist.

本文介绍了采用302负性光刻胶刻制光学度盘的工艺方法。

Studies on a Novel Deep UV Positive Photoresist Material

一种新型深紫外正型光致抗蚀剂材料的研究

Study on Synthesis of Photoresist and Photochemical Process for Information Recording in Laser Disc

激光光盘信息记录光刻胶的合成与感光

Hotplate for Photoresist Baking

用于光刻胶烘干的热板的研制

In the paper diazonaphthoquinone positive photoresist composition for LCD was studied.

文章是有关用于LCD的重氮萘醌系正性抗蚀剂的研究.

Reactive Ion Beam Etching Applied to Photoresist Ashing

反应离子束刻蚀应用于光刻胶灰化技术研究

Methacrylate photoresist was one of the tradition photoresists and it had high transparent and resolution.

甲基丙烯酸树脂光刻胶是传统的光刻胶之一,具有高度的透明性及分辨率.

The mathematics model that showed photoresist spin coating thickness evolvement on spherical surface was put forward.

提出了球面旋涂微米级厚度光刻胶膜层薄化率公式及径向位置演变公式,并得到了膜厚分布的演变公式.

Study on the properties of photoresist baking process Fabrication Technology of Microlens Array by Melting Photoresist

光刻胶烘培特性研究微透镜阵列的光刻胶热熔制作技术

This paper introduces a chemically amplified photoresist appropriate for argon ion laser direct imaging.

本文介绍一种氩离子激光直接成像化学增幅感光树脂.

Method for Controlling Groove Depth and Duty Cycle of Rectangular Photoresist Gratings

一种控制矩形光刻胶光栅槽深和占宽比的方法

The production and application of photoresist, specialty chemicals for flat panel display, printed circuit board material, high-purity reagent, specialty gas and packaging material in China were summarized. At present, 1000 electronic chemicals can be produced in China in commercial scale or in batches.

综述了我国光刻胶、FPD专用化学品、印刷电路板材料、高纯试剂、电子特种气体和封装材料的生产和应用现状，目前我国能工业化生产或批量生产的电子化学品近1000种。

Then, position data direct, toward multiple positions ( 150) on the photoresist material, individual laser output pulses ( 94) of predetermined parameters selected to expose the photoresist material.

然后，定位数据指向光敏抗蚀剂材料上的多个位置（150），指引具有预定参数的每个激光输出脉冲（94），其中预定参数的选择用来使光敏抗蚀剂材料曝光。

Evolvement model of photoresist spin coating thickness on spherical surface

球面旋涂光刻胶膜厚分布的数学模型

No back plate growing method is to electroform metal microstructure on the metal substrate directly by low-cost UV-LIGA technology based on SU-8 photoresist.

无背板生长法是利用SU-8光刻胶，通过低成本的UV-LIGA技术，直接在金属基板上电铸镍图形来实现的。

This will affect the fine graphic quality on the photoresist directly, thereby, it will affect the diffraction efficiency of the binary optical device ultimately.

然而激光器受很多外界因素影响，导致输出功率会产生噪声，这直接影响光刻胶上的直写微细图形质量，从而最终影响二元光学器件的衍射效率。