reactive sputtering

Study on Sputtering Yield in Reactive Sputtering

反应溅射中的溅射产额研究

A novel kinetics model for dc reactive sputtering was proposed.

提出了一个新的直流反应溅动力学模型。

The Study of RF Reactive Sputtering SiO_2 Film

射频反应溅射SiO2薄膜的研究

Hysteresis in Aluminum Oxides Films Growth with Pulsed Reactive Sputtering

铝靶脉冲反应溅射沉积氧化铝薄膜中的迟滞回线的研究

Study on Composition and Structure of ITO Film by Reactive Sputtering

反应溅射掺锡氧化铟薄膜成份与结构的研究

Study on Particle Transport Near the Target Surface in Reactive Sputtering

反应溅射中靶面附近的粒子输运研究

Research for Technique of Large-area Indium-Tin Oxide Film by Magnetron Reactive Sputtering Method

磁控反应溅射制备大面积掺锡氧化铟薄膜工艺探讨

Structure and Properties of ZnO Films Prepared by Ion Beam Reactive Sputtering

反应溅射氧化锌薄膜的结构特点及性质

Since magnetron sputtering is an extremely effective thin film deposition method of high-speed, low-temperature and low-damage, we deposit aluminum oxide films by RF reactive magnetron sputtering, and study their preparation and properties in theory and experiments.

鉴于磁控溅射作为一种高速、低温、低损伤的十分有效的薄膜沉积方法，我们选择射频反应磁控溅射法制备A1203薄膜，从理论和实验上研究了Al203薄膜的制备和性能。

Simulation of Proportion Integration Differentiation Neural Network Control of Reactive Sputtering

反应溅射的PID神经网络控制仿真

Growth Process of Preferential Orientation of AlN Thin Films by Magnetron Reactive Sputtering

磁控溅射氮化铝薄膜取向生长工艺研究

DC Reactive Sputtering Process for Al_2O_3 Film Deposition and Its Applications

直流反应溅射Al2O3膜工艺探讨及应用

Preparation Process of Y_2O_3 Thin Film Using RF Magnetron Reactive Sputtering

射频磁控反应溅射法制备Y2O3薄膜的工艺研究

Study of SnO_2 Thin Film Gas Sensors from Plasma Reactive Sputtering

等离子体反应溅射生成SnO2气体传感器薄膜的研究

Some Problems for the Design of the Filling Gas System of the Magnetron Reactive Sputtering Coating Equipment

磁控反应溅射镀膜设备充气系统设计的几个问题

Dielectric Characteristics of Amorphous Alumina Film Fabricated by Reactive Sputtering

反应溅射制备非晶Al2O3薄膜的介电特性

Carbon Nitride Films Prepared by Reactive Sputtering and Their Structural Analysis

射频溅射制备碳氮薄膜及其结构分析

Compared with reactive sputtering and reactive evaporation deposition, indium oxide fims thus prepared has better adhesion to the glass substrates with improved surface hardness due to the high implantation energy.

与反应溅射和反应沉积相比，此法制备的氧化相膜与玻璃基体的附着良好，并因高的注入能量而改善了玻璃表面硬度。

Deposition technology and properties of chromium oxide coatings by RF reactive sputtering

射频反应磁控溅射制备氧化铬薄膜技术及性能

The aging procedure in amorphous alumina film fabricated by reactive sputtering

反应溅射制备的a-Al2O3薄膜中的时效过程

Transparent Zinc Oxide Thin Films Prepared by DC Diode Reactive Sputtering

直流二极反应溅射沉积透明ZnO薄膜

The Electrochromic Properties of Nickel Oxide Films Prepared by Magnetron reactive Sputtering

磁控反应溅射氧化镍薄膜电致变色特性的研究

Structural analysis of SiCN film prepared by reactive sputtering

反应溅射Si-C-N薄膜的结构分析

Study of Processing and Properties of AIN Films Prepared by Magnetron Reactive Sputtering

磁控反应溅射AIN薄膜的制备工艺与性能研究

Influence of Nitrogen Partial Pressure on Zirconium Nitride Films Grown by DC Reactive Sputtering

直流溅射中氮气分量对氮化锆薄膜性质的影响

The kinetic process of reactive magnetron sputtering has been studied.

研究了反应磁控溅射的动力学过程.

In the fourth chapter Sb-doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.

第五章研究了直流磁控溅射制备Sb掺杂 TiO2的成膜特点.

Development and application for large-area reactive sputtering technology

大面积反应溅射技术的最新进展及应用

Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.

采用磁控射频反应溅射法在单晶硅片上制备了二氧化硅薄膜.

Preparation and Properties of Al_2O_3 Barrier Layers for LCD by RF Reactive Sputtering

用于LCD的氧化铝阻挡层的射频反应溅射沉积及其特性