lithography的例句大全

SODA& LIME glass, PZT thin film by hydrothermal method and PDMS plate by casting moulding are together used to equip a valveless micropump. The processes of lithography, develop and dechromisation, wet etching and masking layer removing are investigated forthe micropump fabrication.

采用SODA&LIME玻璃、水热法制备的压电薄膜和浇注成型的PDMS盖片，通过光刻、显影和除铬、湿法刻蚀、掩蔽层去除等微加工工艺，制作了无阀压电微泵。

Transient Thermal Analysis of X-ray Lithography Mask during Post-exposure baking

X射线光刻掩模后烘过程的瞬态热分析

The focusing of a thermal atomic beam to nanometer_scale dimensions can be realized by a completely off_resonant standing_wave laser field, which can decrease the difficulty of atom lithography experiments.

用完全非共振激光驻波场对热原子束实现纳米量级的聚焦，可以降低原子光刻试验的难度。

Thermal field emission lithography system the present state of the art and Application

热场致发射电子源曝光系统的技术现状和应用前景

Fabrication and Characterization of Controlled Microstructure Photo-Anode for TiO_2 Thin Film by Nano Imprint Lithography

TiO2光阳极有序微结构的纳米压印工艺

Adopting soft lithography method, we make a PDMA cover piece with the reaction chamber and micro channel.

采用软光刻法制作带有微反应腔和微通道的PDMA盖片。

The basic steps of the technology are: first manufacturing prototype using Stereo Lithography Apparatus, and then making mold using the prototype, and last molding product by reaction injection molding.

基本步骤为：首先使用立体光固化快速成型设备制造制品的原型，再以原型为基础模型快速制造模具，然后使用反应注射成型设备快速加工制品。

Exposure intensity effect on the photochemical reaction speed in the lithography for thick film photo-resists

厚胶光刻中曝光光强对光化学反应速率的影响

A Study on Laser Scan Strategy of Stereo Lithography ( SL) Based on Layers' Characteristics

基于层特征的快速成型激光扫描策略的研究

The spin coating process of PMMA membrane is studied, and the surface-quality problems such as the dissolve among layers, stress crack and lithography crinkle are solved.

研究了PMMA的旋涂成膜工艺，解决了层间互溶、应力开裂、光刻起皱等薄膜表面质量问题；

This phenomenon is due directly to the flourishing of workshop printing, the development of movable type printing and lithography.

这与明中叶以来书坊的遍布、活字印刷的发展及石印的推广直接相关。

Study on New Method of Reducing Standing Wave Effects in Lithography

减小光刻中驻波效应的新方法研究

lithography is the foundational equipment of integrated circuit industry, and the line breadth of lithography determine the characteristic size of integrated circuit.

光刻机是集成电路产业的基础设备，光刻机的线宽决定着集成电路的特征尺寸。

One of the most important module improvement is the combination of new LOCOS process development with poly gate lithography process.

关键工艺模块之一是新的LOCOS开发与硅栅光刻工艺改善的结合。

By Fourier transform, produces a fast and accurate calculation for dose precompensation in proximity effect correction for electron beam lithography.

将付里叶变换法运用于电子束曝光的邻近效应校正中，形成了快速、准确的剂量校正法。

Study on Zone Plate Replication Using Hot Embossing Lithography Technology

热压印光刻技术复制波带片图形研究

According to the requirement of the Large-format inkjet plotter, we adopt the 180dpi~ 360dpi transmission grating as the inkjet anchor point detector. Holographic lithography is one of important method for producing transmission grating.

根据十·五期间，我校承担的大幅面喷墨绘图机喷墨定位检测技术的需要，选用180dpi～360dpi透射光栅作为喷墨定位检测器件。

Exposure simulation of a variably rectangular electron beam lithography system

可变矩形电子束曝光的模拟

Controller Design of the Macro-motion Positioning System for Lithography Stencil Stage

光刻机掩模台宏动定位系统的控制器设计

Research of figures with high aspect ratio made by electron beam lithography system

利用电子束曝光系统制作高深宽比图形的研究