lithography的例句大全

Voltage offset influence of the nanometer lithography of the surface of HOPG ( highly oriented pyrolytic graphite) and the state of the needlepoint has been inspected by way of STM.

本文以STM为手段，研究偏压值对高序石墨表面纳米刻蚀及针尖状态的影响。

As the most widely used and most efficient RETs, optical proximity correction ( OPC) improves the fidelity of lithography by modifying the layout patterns on the lithography masks.

光学邻近校正技术作为应用最为广泛，最为有效的分辨率增强技术之一，通过对光刻掩模板上图形的修改达到提高光刻保真度的目的。

Through the use of phase-shift masks ( PSM), optical proximity correction ( OPC), and other resolution enhancement techniques ( RETs), optical lithography have been able to fabricate features smaller than the wavelength of light used to create them.

通过移相掩膜、光学临近校正和其他分辨率增强技术，光学光刻实现了小于入射光波长特征线宽的制造。

To improve the fabrication technology of photoelectrical encoder, the laser lithography method was introduced.

为了改进光电码盘的制作工艺，提高效率，降低成本，提出了一种光电码盘的光刻方法。

All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography ( EUVL).

由于材料的吸收和低折射率问题，极紫外光刻所采用的光学系统发展趋势是全反射型。

The aerial image qualities of depth of focus ( DOF) and optical proximity effect are simulated with the lithography simulation software PROLITH.

利用光刻仿真软件PROLITH，进行了掩模版空间成像的焦深（DOF）和光学临近效应的仿真。

Illumination system, as one of the main parts of lithography, enables to supply high uniformity intensity distribution on the mask, controls exposure dose and creates off-axis illumination ( OAI) modes which enhance the resolution and enlarge depth of focus of lithography.

照明系统是光刻机的重要组成部分，其主要作用是提供高均匀性照明、控制曝光剂量和实现离轴照明，以提高光刻分辨率和增大焦深。

trends of lithography technology based on decreasing of the feature size

从特征尺寸的缩小看光刻技术的发展

The MSM PD is fabricated using standard optical lithography and lift-off process.

器件采用标准的光刻和剥离技术制作。

lithography process is one of the most important semiconductor manufacturing process steps, it is used to copy mask plate pattern on the silicon wafer for next lithography step.

光刻工艺是半导体制造中最为重要的工艺步骤之一，其作用是将掩膜板上的图形复制到硅片上，为下一步工序做好准备。

Wafer stage is a key subsystem in the extreme ultra violet lithography ( EUV).

工件台系统是极紫外光刻（EUV）的一个关键子系统。

Mark image geometric distortion calibration in alignment system for multilevel imprint lithography

压印对正系统中标记图像几何畸变的校正

It also analysed the finite element method and its application in the lithography protype development and simulation analysis phase.

本文概述了国内外光刻机工件台的研究现状，分析了有限元法在光刻机样机研制过程中仿真分析的应用。

Methods of proximity effect correction in electron beam lithography

电子束光刻中邻近效应校正的几种方法

Electron beam lithography machine is the key instrument for mask making and research of nanometer device.

电子束曝光技术是掩模版制作和纳米器件研究的主要手段。

As a development tool, lithography simulation excels due to its speed and cost-effectiveness.

作为一个发展工具，平白印刷模型的优势在于它的速度和投入产出。

Progress in Focus and Level Sensor for Projection Lithography System

投影光刻机调焦调平传感技术的研究进展

Wafer handling robot is automated material handling equipment used in Lithography machine which is the core of semiconductor manufacturing equipment. Its working speed, positioning accuracy, reliability, cleanliness impact on the lithography process directly in the production efficiency and manufacturing quality.

光刻机是半导体制造的核心装备，硅片传输机器人是其内部专用的自动物料处理设备，它的工作速度、定位精度、可靠性，使用洁净度等直接影响光刻工序中的生产效率和制造质量。

according to the requirements of a lithography exposure system on illumination uniformity, the illumination errors caused by peak reflectivity or bandwidth or centroid wavelength within same range of roughness are discussed.

根据光刻系统对照明均匀性的要求，讨论了在相同粗糙度变化范围内，分别由峰值反射率、带宽和中心波长引起的照明误差。

precise temperature control system of projection optics of scanner lithography

步进扫描投影光刻机投影物镜精密温度控制系统