lithography的例句大全

the islands with nano or micro diameters are firstly fabricated with nano island lithography, and then nano holes, nano islands, nano wells can be made from the islands by using liftoff, rie etching, or other fabrication methods.

利用该技术制造出几十纳米到微米尺度的岛结构，然后利用剥离、刻蚀等微加工技术，将该岛转化成纳米孔、纳米岛、纳米井等结构。

pressure from let value is less than zero, nano-imprint lithography ink drum-stick.

不张力过不小即让值小于零时，不抬印滚筒粘不朱。

principle of electron beam lithography and its application on the nanofabrication and nanodevice

电子束光刻技术的原理及其在微纳加工与纳米器件制备中的应用

offset lithography: a modification of the lithography process by an american i. w. rubul.

间接石印（柯式）：由美国人鲁布把石印方法改良而成的间接印刷方法。

the improvement of manufacture level of lithography can arouse the technique of the whole integrated circuit industry, which can also promote the development of national economy and raise the competitive power in high-technology area at the same time.

光刻机研制水平的提高能够带动整个集成电路产业界的技术升级，能够有效地促进国家经济的发展和提高国家高技术领域的核心竞争力。

the principles of liga process on mask, x-ray lithography, electroform and model were analyzed.

对LIGA工艺掩膜、X射线光刻、电铸及塑铸等进行了工艺原理分析。

ferromagnetic resonance study on the permalloy submicron rectangular arrays prepared by electron beam lithography

电子束光刻亚微米矩形阵列的坡莫合金薄膜铁磁共振谱的研究

the new troika systems line-up spans a wide range of printing disciplines, including gravure, intaglio, flexography, and lithography.

新的三驾马车系统系列产品的跨度范围广泛的印刷学科，包括凹印机，凹版印刷，凸版印刷，平版。

Lithography and Reactive Ion Etching of Silicon-Based Photon Crystal Slab

硅基光子晶体板的光刻和反应离子刻蚀

The development of soft X-ray CZP included design of optical path, selection of material, preparation of thin film, sub-micron lithography, X-ray lithography, reactive ion etching, ion beam etching, electroplating and chemical etching.

软X射线聚焦波带片的研制包括光路设计、膜系设计、衬底选择、薄膜制备、亚微米光刻、X射线光刻、反应离子刻蚀、离子束刻蚀、电镀和化学腐蚀等多种微细加工技术。

The novel methods include nano-imprint, laser interference lithography, x-ray lithography, electron beam lithography, focused ion beam and so on.

包括纳米压印、激光干涉光刻、x射线光刻、电子束光刻、聚焦离子束刻蚀等。

nikon and rival asml holding nv are going toe-to-toe in lithography, but the two the companies have markedly different strategies.

尼康和ASML在高端光刻机领域是一对死对头，不过两家公司的EUV战略有着显著的不同之处。

asml provides lithography systems for the semiconductor industry.

阿斯麦公司主要为半导体行业提供刻录系统。

An analytical model is developed to verify the numerical simulation for X-ray lithography mask etching process using finite element ( FE).

开发了理论模型以验证有限元方法用于X射线光刻掩模刻蚀过程数值仿真的正确性。

progress of scanning probe lithography and study on scanning plasma etching technology

扫描探针加工技术的新进展及扫描等离子体加工技术的研究

GaAs/ AlGaAs quantum dots were made by Electron Beam Lithography ( EBL) and Reactive Ion Etching ( RIE) on GaAs/ AlGaAs quantum well wafers. Their photoluminescence shows blue shift, the amount of blue shift increases with the decrease of quantum dot size.

采用电子束曝光和反应离子刻蚀的工艺，将GaAs／AlGaAs量子阱外延材料制成量子点阵，其光荧光谱显示出蓝移，并且蓝移量随着量子点直径尺寸的减少而增大。

Simulation of X-ray Lithography Mask Distortion during Back-etching

X射线光刻掩模背面刻蚀过程中的形变仿真

power semiconductor device chip manufacturing process is actually repeated several times on film formation, lithography and doping process in a substrate, and its primary task is to solve the problem of film formation.

功率半导体器件芯片制造过程中实际上就是在衬底上多次反复进行的薄膜形成、光刻与掺杂等加工过程，其首要的任务是解决薄膜制备问题。

the plates in the plates of the rollers, scraping knife components and nano-imprint lithography drum composition of gravure press.

这种印版用在由印版滚筒、刮墨刀组件及压印滚筒组成的凹印机上。

in the next generation lithography ( ngl) technology, extremely ultraviolet lithography ( euvl) has high-resolution, certain output and technical extension property of traditional lithography, so it becomes one of the first-selected lithography schemes for preparing the nanometer ulsi de-vices in ic circles.

在下一代光刻技术中，由于极紫外光刻（EUVL）分辨率高、且具有一定的产量优势及传统光学光刻技术的延伸性，因而是IC业界制备纳米级ULSI器件的首选光刻方案之一。