magnetron的例句大全

Microstructure and Mechanical Properties of Diffusion Bonded Joints Between Carbon Steel and Titanium with Copper Interlayer Ti-Al Film Used as Diffusion Barrier for Copper Interconnection Deposited by RF Magnetron Sputtering

钢/铜/钛扩散复合界面显微组织和力学性能磁控溅射法制备用作铜互连阻挡层的钛-铝薄膜

The iron-doped nickel oxide catalysis films were deposited by DC reactively magnetron sputtered apparatus with two face-to-face targets. The influence of sputtering pressure on structure character, morphology, overpotential, resistivity and growth rate was studied.

采用对靶直流磁控溅射设备制备镍铁氧化物催化薄膜，研究了溅射气压与催化薄膜的结构、表面形貌、过电位、电阻率及生长速率之间的关系。

Based on this, the author proposes three ways to improve the efficiency of relativistic magnetron from different perspectives: ① lower the load Q value; ② set an upper limit to work current; ③ array of relativistic magnetron with high impedance.

以此为基础，作者从不同的角度提出了三种改善相对论磁控管效率方案：①降低有载Q值；②限制工作电流；③高阻相对论磁控管锁相阵列。

Comparing with magnetron sputtering, thermal evaporation can fabricate both n-type and p-type conducting CuO thin films without being doped.

同磁控溅射法相比，热蒸发法在不掺杂的情况下，不仅制备出了具有n型导电特性的CuO薄膜，而且制备出了具有p型导电特性的CuO薄膜。

The application and features of vaccum strip coating processes such a thermal jet evaporation, magnetron sputtering, electron-beam evaporation and plasma enhanced EB evaporation process were reviewed.

介绍了新一代连续带钢镀膜技术-真空镀膜的工艺特点及应用现状。

Single crystal silicon slice as target, Ar and O_2 respectively as sputtering and reacting gas, a silicon oxides ( SiO_x) film was deposited on Al substrate by reactive magnetron sputtering.

以单晶硅片为靶材，高纯Ar和O2分别为溅射气体和反应气体，采用反应磁控溅射法在铝基体上制备了硅氧化物薄膜。

TiN thin film with ( 002) preferred orientation was grown by the DC magnetron sputtering at the condition of pure N_2 reacting gas, 1.6 A of the current of DC sputtering and 500 ℃ of the substrate temperature.

应用直流磁控溅射方法，在500℃的衬底温度、纯氮气的溅射气体、800w溅射功率的条件下制备出（002）择优取向的TiN薄膜。

Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.

多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。

ZnO films can be deposited by a variety of deposition techniques. Magnetron sputtering, metal-organic chemical vapor deposition, pulsed laser deposition, molecular beam epitaxy and reactive e-beam evaporation are main methods for the preparation of high-quality ZnO films with strong c-axis orientation.

在已开发的众多生长技术中，磁控溅射、金属有机物气相沉积、脉冲激光沉积、分子束外延、电子束反应蒸镀法是生长出高度c轴择优取向优质薄膜的主要方法。

Preparation Process of Y_2O_3 Thin Film Using RF Magnetron Reactive Sputtering

射频磁控反应溅射法制备Y2O3薄膜的工艺研究

Some Problems for the Design of the Filling Gas System of the Magnetron Reactive Sputtering Coating Equipment

磁控反应溅射镀膜设备充气系统设计的几个问题

Growth Process of Preferential Orientation of AlN Thin Films by Magnetron Reactive Sputtering

磁控溅射氮化铝薄膜取向生长工艺研究

The Electrochromic Properties of Nickel Oxide Films Prepared by Magnetron reactive Sputtering

磁控反应溅射氧化镍薄膜电致变色特性的研究

Research for Technique of Large-area Indium-Tin Oxide Film by Magnetron Reactive Sputtering Method

磁控反应溅射制备大面积掺锡氧化铟薄膜工艺探讨

Study of ITO Transparent Conducting Thin Films Deposited by DC Magnetron Reactive Sputtering

直流磁控反应溅射沉积ITO透明导电膜的研究

Plasma Emission Monitoring and TiO_2 Films Growth by Mid-Frequency Dual Magnetron Reactive Sputtering

等离子体发射监控系统参与的中频孪生反应磁控溅射沉积TiO2薄膜的实验研究

Influence of Ar and Nz Flow Ratio on TiN Thin Films Prepared by Magnetron Sputtering

氩气与氮气流量比对磁控溅射法制备TiN薄膜的影响

By using these targets, CeO2-TiO2 films and CeO2-TiO2/ SnO2: Sb films were deposited on soda-lime glass substrates by radio fre-quency magnetron sputtering.

以所制靶材用射频磁控溅射法在普通玻璃基片上沉积了CeO2-TiO2单层和CeO2-TiO2/SnO2：Sb双层薄膜。

ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.

采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。

The power supply will be convenient for controlling the magnetron sputtering coater automatically.

该电源为磁控溅射镀膜设备实现自动控制提供了方便。