magnetron的例句大全

Relationship between Internal Pressure of Vacuum Tube and Ionic Current of Magnetron Discharge

真空灭弧室内气体压强与离子电流的关系

The results of DC reactive magnetron sputtering& sulfide show that sulfide temperature can significantly affect on the surface of WS2 film and crystallization rate, but little affect on the chemical composition.

反应磁控溅射硫化法检测结果表明硫化温度对WS2薄膜的表面形貌和结晶率有明显的影响，而对膜层的化学成分影响不大。

Metallic antimony thin film was deposited by magnetron sputtering and it was investigated as anode materials for lithium-ion batteries.

采用磁控溅射方法制备金属锑薄膜，并把它作为锂离子二次电池负极进行研究。

Make use of magnetron sputtering, evaporation, vacuum vapor deposition, laser etching to prepare continuous or not continuous metal films also caused most interesting of the scholar.

而利用磁控溅射、热蒸镀、电化学沉积等方法制备的连续或者非连续金属膜衬底在表面增强荧光效应中也得到了广泛的应用。

Tantalum oxide and tantalum nitride films with different composition, microstructure, physical and mechanical properties fabricated by unbalanced magnetron sputtering were investigated in this paper.

本论文采用非平衡磁控溅射技术制备出不同成分、结构、物理性能和力学性能的Ta-O和Ta-N薄膜。

Tantalum oxide thin films were deposited by reactive DC magnetron Sputtering from a tantalum target in Ar-O2 mixture.

在Ar-O2混合气氛中采用直流磁控反应溅射沉积制得了氧化钽薄膜。

Tantalum Pentoxide ( Ta2O5) films were prepared by pulsed DC reactive magnetron sputtering method.

采用直流脉冲反应磁控溅射方法制备了高介电常数五氧化二钽（Ta2O5）薄膜。

Pure Cr coatings were deposited under different target voltage and bias voltage& duty cycle by closed-field unbalanced magnetron sputtering.

本文采用闭合场非平衡磁控溅射离子镀技术在不同的靶电压、偏压、占空比下制备了纯Cr镀层。

The Effect of Process Parameters on Plasma Environment of RF Magnetron Sputtering PTFE Target With Negative Pulse-Voltage Bias

工艺参数对射频磁控溅射PTFE靶形成的等离子体组成的影响

In a word, the structure and performance of the single cell prepared by magnetron sputtering are better than those prepared by slurry spin coating.

相比较而言，磁控溅射法制备的单电池的结构和性能优于浆料旋涂法制备的单电池。

the advantages of the magnetron sputtering are its stable process, uniform film structure and high quality of surface, but its shortcoming is low adhesion strength owing to its low ionization rate and low energy.

而磁控溅射的特点是工艺稳定、膜层结构较均匀、表面质量高，但其缺点是离化率低、粒子能量小，从而影响膜与基底的结合力。

Thin films of TiN were deposited on float glass substrates by DC reactive magnetron sputtering.

用直流反应磁控溅射法在浮法玻璃基片上制备了TiN薄膜。

plating metal film on the surface of particles using magnetron sputtering method

微颗粒表面磁控溅射镀金属膜实验

and a high voltage transformer and a magnetron are arranged in the high temperature zone.

所述的高压变压器、磁控管安置于高温区。

technological study on ni thin film thermistor as temperature sensor during magnetron sputtering

磁控溅射制备镍薄膜热阻温度传感器工艺研究

raman spectrometer and atom force microscope were employed to study and determine the structure and characteristics of the films prepared by the method of magnetron sputtering with graphite target.

用激光拉曼谱和原子力显微镜等现代分析手段研究了磁控溅射石墨靶制备的薄膜的结构和特性。

well distributed ti coatings were formed on the surface of cbn grits by means of magnetron sputtering method.

通过磁控溅射及其后处理等方法在立方氮化硼（简写cBN）表面形成均匀的Ti镀层。

synthesis of one-dimensional zno nanorods by oxidating zinc films deposited with magnetron sputtering

热氧化磁控溅射金属锌膜合成一维ZnO纳米棒

study on magnetron sputtering thin film tin and intellectualizing liquid level sensor

磁控溅射TiN膜并智能化处理的液位传感器研究

a cr layer with thickness of 150 nm was successfully deposited on the surface of diamond particles using dc magnetron sputtering technique.

运用直流磁控溅射法可在金刚石颗粒表面沉积150nm的金属Cr层。