reactive etching的例句大全

Reactive ion etching of polysilicon using SF6+ Ar reactive gas is investigated.

本文对以SF6+A r为反应气体的反应离子刻蚀（RIE）多晶硅工艺进行了研究。

In Situ Monitoring of Etching End Point for Plasma and Reactive ion Etching by the Optical Reflection

等离子与反应离子刻蚀终点的在线监测&光学反射法

Effect of Gas Species on the Depth Reduction in Silicon Deep-Submicron Trench Reactive Ion Etching

在硅深－亚微米沟道反应离子刻蚀中气体成分对深度减小的影响

Reactive Ion Etching of Silicon for Trench Isolation

深槽隔离技术中硅的反应离子刻蚀

Lithography and Reactive Ion Etching of Silicon-Based Photon Crystal Slab

硅基光子晶体板的光刻和反应离子刻蚀

Reactive Ion Etching of Deep U Trench

深U型槽的反应离子刻蚀技术

Deep Reactive Ion Etching ( DRIE) Device in the MEMS Fabrications

用于MEMS器件制造的深反应离子刻蚀设备

The development of soft X-ray CZP included design of optical path, selection of material, preparation of thin film, sub-micron lithography, X-ray lithography, reactive ion etching, ion beam etching, electroplating and chemical etching.

软X射线聚焦波带片的研制包括光路设计、膜系设计、衬底选择、薄膜制备、亚微米光刻、X射线光刻、反应离子刻蚀、离子束刻蚀、电镀和化学腐蚀等多种微细加工技术。

A Reactive Ion Etching Rate Model for VLSI Process Simulation

一种用于VLSI工艺模拟的反应离子刻蚀速率模型

Study on Magnetically Enhanced Reactive Ion Etching of BST Thin Films

BST薄膜的磁增强反应离子刻蚀研究

Study on Anisotropic Etching in Reactive Ion Etching of PMMA

反应离子刻蚀PMMA的各向异性刻蚀研究

Reactive Ion Etching of SiO_2 in Planar Lightwave Circuit Fabrication

SiO2平面光波导工艺中的反应离子刻蚀研究

Investigation on Reactive Ion Beam Etching of SiO_2 and Si

反应离子束刻蚀二氧化硅和硅研究

Research on Ar/ CHF_3 Reactive Ion Beam Etching of SiO_2

Ar/CHF3反应离子束刻蚀SiO2的研究

Reactive Ion Beam Etching and Thermal Effect

反应离子束蚀刻中温度效应的研究

Reactive ion beam etching for diffractive optical elements

衍射光学元件的反应离子束蚀刻研究

Technology of reactive ion beam etching of blazed gratings

反应离子束刻蚀闪耀光栅技术

Reactive Ion Beam Etching Applied to Photoresist Ashing

反应离子束刻蚀应用于光刻胶灰化技术研究

Reactive Ion Beam Etching Machine, RIBE-5

RIBE-5型反应离子束刻蚀机

The results on fabrication of refractive microlens arrays using heat forming and reactive ion beam etching ( RIBE) techniques are presented.

提出一种微透镜阵列复制的新方法反应离子束蚀刻法（RIBE）。